In celebration of 15 years of Pattern Inc., we invite artists to submit work for “The Pattern Effect”, an art exhibition exploring the transformational power of patterns, in both art and community. This dual-themed show highlights how visual repetition, rhythm, and structure influence artistic practice while honoring Pattern Inc.’s profound effect on Central Indiana’s creative landscape.
From elevating local designers to curating authentic storytelling and design-forward platforms, Pattern Inc. has left a lasting imprint. Now, we reflect that legacy back through art.
We welcome artwork that explores:
➔ Visual Patterns: Geometric structures, optical rhythms, tessellations, motifs.
➔ Cultural Patterns: Indigenous, textile, spiritual, architectural, or ancestral designs.
➔ Narrative or Conceptual Patterns: Symbolic repetition or ritualistic forms.
➔ Community Patterns: A visual or conceptual response to Pattern Inc.’s creative ripple effect in Central Indiana.
Interpretations may be literal, abstract, or conceptual. All styles and mediums welcome.
➔ Open to all Indiana Artists
➔ Accepting works in 2D, 3D, textile, digital, and mixed media.
➔ Artists must be 18 or older. Collaborative and interdisciplinary work is encouraged.
Submission Deadline: August 20, 2025
Submit via Email: Salma.Taman@Patternindy.com
Required Materials:
➔ Up to 3 works (high-res images, titled, dated, sized & priced)
➔ Artist statement
➔ Artist Bio
Timeline:
Submission Deadline: August 20
Notification of Acceptance: August 25
Artwork Drop-off: August 27 – 29
Opening Reception: Sept 4, (5:30–7:30 PM)
Exhibition on View: Sept 4 – Oct 6
Submission Form:
https://forms.gle/xQej7gYCSmJc3kwR7